Inkjet-Printed Molybdenum Disulfide and Nitrogen-Doped Graphene Active Layer High On/Off Ratio Transistors




Jewel, Mohi Uddin
Monne, Mahmuda Akter
Mishra, Bhagyashree
Chen, Maggie Yihong

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Multidisciplinary Digital Publishing Institute


Fully inkjet-printed device fabrication is a crucial goal to enable large-area printed electronics. The limited number of two-dimensional (2D) material inks, the bottom-gated structures, and the low current on/off ratio of thin-film transistors (TFTs) has impeded the practical applications of the printed 2D material TFTs. In the search for TFTs with high current ratios, we introduce a stable and efficient method of nitrogen-doped graphene (NDG) ink preparation for inkjet printing by liquid-phase exfoliation. The NDG thin film is print-stacked with molybdenum disulfide (MoS2) by multiple printing passes to construct a MoS2−NDG stack. We demonstrate top-gated fully inkjet-printed MoS2−NDG transistors with silver drain, source, and gate electrodes, and a barium titanate (BaTiO3) dielectric. A 100% inkjet-printed MoS2−NDG vertical 2D active heterostructure layer transistor with a current on/off ratio of 1200 is exhibited. The results may lead towards the development of all-printed 2D material-based transistor switches.



graphene, molybdenum disulfide, raman, thin-films, cross-section, nanosheets, on/off ratio, transistor, inkjet printing, Ingram School of Engineering


Jewel, M. U., Monne, M. A., Mishra, B., & Chen, M. Y. (2020). Inkjet-printed molybdenum disulfide and nitrogen-doped graphene active layer high on/off ratio transistors. Molecules, 25(5), 1081.


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