Attenuated Total Reflectance – Fourier Transform Infrared Spectroscopy Analysis of Pulsed Electron Deposited Silicon Dioxide Film on Silicon Substrate

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dc.contributor.advisorDonnelly, David
dc.contributor.authorFerguson, Patrick P.
dc.contributor.committeeMemberSpencer, Gregory
dc.contributor.committeeMemberGeerts, Wilhelmus
dc.date.accessioned2010-08-25T20:49:11Z
dc.date.available2010-08-25T20:49:15Z
dc.date.issued2010-08
dc.description.abstractFour peaks in the Infrared (IR) spectral region of 1300 cm-1 – 1000 cm-1 were isolated for 13 sample spectra. The 1300 cm-1 – 1000 cm-1 region corresponds to the asymmetric stretching modes of the SiO2 crystal. The four peaks were compared based on their amplitudes, positions, and full width at half maximums. The comparisons were made in an effort to identify the ideal Pulsed Electron Deposition (PED) conditions and also to compare the PED method to another method, Electron Beam (E-Beam) deposition. The E-Beam deposition samples had stronger absorbance than the PED samples for all four peaks. This study found that the ideal growth temperature for PED of silicon dioxide is 850 °C which was the highest of all the growth temperatures. Also, the thickest samples, about 500 nm films, had the best IR characteristics. The Si substrate orientation also affected the SiO2 film. The {100} substrate orientation preformed worse than the {111} orientation.
dc.description.departmentPhysics
dc.formatText
dc.format.extent75 pages
dc.format.medium1 file (.pdf)
dc.identifier.citationFerguson, P. (2010). Attenuated total reflectance – Fourier transform infrared spectroscopy analysis of pulsed electron deposited silicon dioxide film on silicon substrate (Unpublished thesis). Texas State University-San Marcos, San Marcos, Texas.
dc.identifier.urihttps://hdl.handle.net/10877/4586
dc.language.isoen
dc.subjectATR
dc.subjectthin film
dc.subjectSiO2
dc.subjectsilicon dioxide
dc.subjectFourier
dc.subjectFTIR
dc.subjectattenuation
dc.subjectsilica
dc.subjectFourier transform infrared spectroscopy
dc.titleAttenuated Total Reflectance – Fourier Transform Infrared Spectroscopy Analysis of Pulsed Electron Deposited Silicon Dioxide Film on Silicon Substrate
dc.typeThesis
thesis.degree.departmentPhysics
thesis.degree.disciplinePhysics
thesis.degree.grantorTexas State University-San Marcos
thesis.degree.levelMasters
thesis.degree.nameMaster of Science

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